I’m pleased to welcome Aselta Nanographics and Metis Microsystems to the ESD Alliance community. Both have countless reasons for joining. For example, Yorick Trouiller, Aselta Nanographics’ CEO, noted: “Joining the ESD Alliance is a great opportunity to stay connected with the EDA community and take an active part in the discussions driving the future of semiconductor manufacturing.”
According to Azeez Bhavnagarwala, founder of Metis Microsystems, “As a startup dedicated to enabling energy efficiency in semiconductor products, we are excited about the opportunities the ESD Alliance and SEMI offer to connect with the network of industry members. Both the ESD Alliance and SEMI have initiatives and resources offered by their domain-specific Smart Initiatives, Technology Communities and Committees that can help us understand and engage with industry members as a startup on topics of common interest.”
Our New Members
Aselta Nanographics of Grenoble, France, provides advanced software solutions for wafer and mask patterning based on e-beam technology. It develops software tools to improve the quality process of chip production and operates in the IC manufacturing world providing advanced software solutions for wafer and mask patterning based on e-beam technology as well as solutions for contour-based metrology. Aselta Nanographics is a spin-off of CEA-Leti and maintains strong links with cutting-edge fundamental research and applies it to deliver advanced industrial solutions to customers in the U.S., Europe and Asia.
