Note: Below is a Q&A post I did initially for SEMI’s blog with Thiago Figueiro, vice president of Sales, Marketing and Business Development at Aselta. Aselta produces software for wafer and mask patterning based on e-beam technology for IC manufacturing, along with advanced metrology solutions for scanning electron microscopes. Our wide-ranging conversation covered trends and improvements in semiconductor manufacturing, supply chain challenges and the startup experience in France.
Aselta Nanographics of Grenoble, France, which produces software for wafer and mask patterning based on e-beam technology for IC manufacturing, along with advanced metrology solutions for scanning electron microscopes, recently became an ESD Alliance member. Adding to its impressive credentials, Aselta is a spin-off of CEA-Leti, the electronics and information technologies research institute also in Grenoble.
The increasing complexity of IC manufacturing poses a number of challenges including the mask data preparation required to enable technology improvements such as multi-beam (MB) mask writers and extreme ultraviolet (EUV) lithography. Measuring and inspecting the effects both on reticle and on wafer are also challenging.
