June 25, 2007
High Frequency – Applied Wave Research
Please note that contributed articles, blog entries, and comments posted on EDACafe.com are the views and opinion of the author and do not necessarily represent the views and opinions of the management and staff of Internet Business Systems and its subsidiary web-sites.
Jack Horgan - Contributing Editor


by Jack Horgan - Contributing Editor
Posted anew every four weeks or so, the EDA WEEKLY delivers to its readers information concerning the latest happenings in the EDA industry, covering vendors, products, finances and new developments. Frequently, feature articles on selected public or private EDA companies are presented. Brought to you by EDACafe.com. If we miss a story or subject that you feel deserves to be included, or you just want to suggest a future topic, please contact us! Questions? Feedback? Click here. Thank you!

The top articles over the last two weeks as determined by the number of readers were:

Mentor Graphics Acquires Sierra Design Automation; Answers Industry Need for Design-to-Fab Flow for 65 and 45 Nanometers  Mentor has acquired Sierra Design Automation (Santa Clara) a provider of high-performance place and route solutions for $90 million, payable 50 percent in cash and 50 percent in stock.  Sierra's Olympus-SoC product delivers place and route system that concurrently addresses variations in lithography, process corners and design modes. Sierra's detailed routing architecture embeds
variation-aware timing, optimization and litho-modeling to address optical proximity correction (OPC) and resolution enhancement technology (RET) effects early in the design cycle ensuring faster timing closure for complex process rules.

Synopsys Acquires ArchPro Design Automation ArchPro's technologies enable engineers to address power management challenges in multi- voltage designs from chip architecture to RTL and gate-level design. These technologies allow verification of modern power management techniques such as power gating, substrate biasing, dynamic voltage and frequency scaling, and extend Synopsys' leadership in low power design and verification. Terms of the deal are not being disclosed at this time.

STMicroelectronics Unveils Design Platform for Low-Power Next-Generation 45nm CMOS ST's innovative low-power process option with multiple threshold transistors cuts the silicon area by half compared to designs implemented in 65nm technology. At the same time, the process improves speed by up to 20% or reduces leakage current by half while in operation, and, in retention mode, reduces leakage current by several orders of magnitude. This latter option will bring important benefits to designers of portable
products, where battery life is a significant factor.

Volvo Trucks and Mentor Graphics Successfully Complete AUTOSAR Project AUTOSAR is the standards organization working to create an open standard for automotive engineering architecture. Mentor is a premium member of AUTOSAR. The project entailed completely redeveloping an existing climate control system using AUTOSAR technology. The goal of the project was to increase the knowledge about AUTOSAR within the Volvo group as well as evaluate commercial viability of the AUTOSAR concept itself.

Charlie Hauck Assumes CEO Role at Bluespec Hauck has more than 25 years experience in research and development, engineering, marketing and management from within the semiconductor industry. Prior to Faraday Technology, he served as vice president of Engineering at Lexra Inc., a microprocessor SIP company. He holds a Bachelor of Science in Electrical Engineering from the Johns Hopkins University and a Master of Science in Electrical Engineering from the Massachusetts Institute of Technology.  Hauck succeeds Shiv Tasker, who assumes the role of
chairman.

Synopsys and Hitachi High-Technologies Deliver Enhanced OPC Modeling Speed, Accuracy and Predictability The two firms announced that they have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution. Focused on incorporating manufacturing-aware metrology data into design, this common DFM interface helps mutual customers to develop faster, more accurate and predictive OPC models for advanced 45 nm and beyond
technologies. Moreover, Proteus customers can achieve higher OPC model predictability and reduced model-building cycle time

Other EDA News
  • Other IP & SoC News

  •  



    « Previous Page 1 | 2 | 3 | 4             


    You can find the full EDACafe event calendar here.


    To read more news, click here.



    -- Jack Horgan, EDACafe.com Contributing Editor.


    Rating:


    Review Article Be the first to review this article
    Downstreamtech.com

    EMA:

    Featured Video
    Editorial
    Peggy AycinenaWhat Would Joe Do?
    by Peggy Aycinena
    Retail Therapy: Jump starting Black Friday
    Peggy AycinenaIP Showcase
    by Peggy Aycinena
    REUSE 2016: Addressing the Four Freedoms
    More Editorial  
    Jobs
    Development Engineer-WEB SKILLS +++ for EDA Careers at North Valley, CA
    AE-APPS SUPPORT/TMM for EDA Careers at San Jose-SOCAL-AZ, CA
    Principal Circuit Design Engineer for Rambus at Sunnyvale, CA
    FAE FIELD APPLICATIONS SAN DIEGO for EDA Careers at San Diego, CA
    Manager, Field Applications Engineering for Real Intent at Sunnyvale, CA
    ACCOUNT MANAGER MUNICH GERMANY EU for EDA Careers at MUNICH, Germany
    Upcoming Events
    Zuken Innovation World 2017, April 24 - 26, 2017, Hilton Head Marriott Resort & Spa in Hilton Head Island, SC at Hilton Head Marriott Resort & Spa Hilton Head Island NC - Apr 24 - 26, 2017
    CST Webinar Series



    Internet Business Systems © 2016 Internet Business Systems, Inc.
    595 Millich Dr., Suite 216, Campbell, CA 95008
    +1 (408)-337-6870 — Contact Us, or visit our other sites:
    AECCafe - Architectural Design and Engineering TechJobsCafe - Technical Jobs and Resumes GISCafe - Geographical Information Services  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
      Privacy Policy