April 23, 2007
DATE 2007: Secrets et Surprises à la Côte d'Azur
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Bluespec announced that The Association for Computing Machinery (ACM) has named
Arvind, founder of Bluespec, a 2006 ACM Fellow. Arvind is the Johnson professor of Computer Science and Engineering at MIT and receiving this award for his contributions to dataflow computing and verification. He was on hand at DATE presenting a tutorial on Monday about ESL design.
Cadence Design Systems announced that
UMC has joined the Power Forward Initiative (PFI), “formed to advance the adoption of the Common Power Format (CPF) which captures essential design intent for power and links the design, implementation and verification domains.”
Calypto Design Systems announced that its PowerPro CG product, that the company designed to reduce power at the RTL level, will support Si2’s Common Power Format 1.0 (CPF) . Calypto also says it has joined the Si2’s Low-Power Coalition (LPC) “to further work with customers and EDA vendors on improving interoperability between power optimization, design and verification tools.”
Carbon Design Systems announced that its models are plug-and-play with CoWare’s Platform Architect design environment. Per the company, “these models support a programmer friendly view of the hardware for system validation and have transaction-level interfaces for high-speed execution.”
CebaTech announced the CebaIP Platform, which the company says is a protocol-complete hardware and software framework for developing end-to-end data and storage networking solutions. Platform configurations initially supported include GZIP-based compression and decompression with optional AES support, and a second configuration that includes partial TCP/IP offload with optional link aggregation, VLAN, and large send offload (LSO) support.
Chartered Semiconductor Manufacturing announced realignment of various senior management roles.
Kay Chai Ang becomes senior vice president of worldwide sales and marketing.
Simon Yang becomes senior vice president of fab operations, in addition to his existing role as CTO.
Mike Rekuc becomes president of the Americas region. And,
Dominique Simon becomes vice president of business development and global accounts.
Si2 are announced an escrow agreement whereby Si2 becomes the beneficiary of Ciranova’s PyCell Studio just in case Ciranova product is no longer available for free to customers. Ciranova says it is committed to making the use of its PyCell technology free and open, and that now Si2 as an even more important standards keeper.
CoFluent Design announced it has opened operations in the U.S. and established CoFluent Design, Inc. as a fully-owned subsidiary of CoFluent Design. The company also named
Hagay Zamir as Business Development Director for the U.S., based in San Jose. Prior to CoFluent, he was at Summit Design and CARDtools Systems. The company also announced CoFluent Studio was selected to be part of the CIM PACA (Center for Integration of Microelectronics in Provence) collaborative research platform.
Computer Simulation Technology (CST) announced its CST Microwave Studio 2006B is offering increased performance for signal integrity analysis. Per the Press Release: “Engineers studying signal integrity, power integrity, or general EMC/EMI effects can now investigate their structures using CTS’s full-wave 3D EM simulator without having to introduce approximations.”
Concept Engineering announced a new detailed standard parasitic format (DSPF) interface to the company’s SpiceVision PRO and SGvision PRO products that the company says will “enable design engineers to better understand, manage, and fix parasitic structures within complex digital, mixed-signal, and analog ICs. The layout of an IC contains an enormous number of parasitic devices resulting from the interconnections and components of the chip. Such parasitic networks, often modeled as DSPF files, describe the parasitic resistance and capacitance of signal nets within an IC.”
Coupling Wave Solutions (CWS) introduced WaveIntegrity, a software platform for modeling signal integrity and noise propagated though IC substrate, interconnect, and package. Propagated noise can be monitored at any point in the system, from power supply nodes to a specific location at the surface of the silicon substrate. The tool has been developed in partnership with NXP and STMicroelectronics.
The Design Automation Conference (DAC) announced that
Jan Willis, Senior Vice President for Industry Alliances at Cadence Design Systems, is the 2007 recipient of the
Marie R. Pistilli Women in Electronic Design Automation Achievement Award. Per the Press Release: “Jan Willis is being recognized for her commitment and dedication to fostering the careers of women in EDA.”
EDAC’s Maret Statistics Service announced that EDA industry revenue for Q4 2006 was $1.493 million, which is 19 percent more than Q4 2005. MSS also announced that 2006 full-year revenue for EDA was $5.274 million, a 15-percent increase over 2005. In addition, MSS says that 25,390 people were employed in the EDA industry in Q4 2006, which was up 10 percent over Q4 2005.
EMA Design Automation announced that it has contracted with
ALS Design in France as the first international VAR to sell EMA’s TimingDesigner. The companies say, “ALS Design is the market leader in France for EDA solutions and the provider of high-performance training services.”
Esterel announced that the IEEE has begun work on the IEEE P1778 Standard for Esterel v7 Language Reference Manual, which the company says will stabilize and fully define the syntax and semantics of the language. Per the Press Release: “Esterel v7 expresses he interaction of hardware, software, and temporal synchronization, and helps increase design efficiency and reliability for semiconductor and other embedded systems. It is scheduled for completing in mid-2008.”
EVE announced the formation of EVE Design Automation Pvt. Ltd., a wholly owned subsidiary based in Bangalore, India, known as EVE DA. The new subsidiary is headed by
Montu Makadia and will market and support the company’s ZeBu platforms of accelerators, emulators, and FPGA prototypes.
the strength and uniqueness of the FPGA device and the flexibility of popular simulators to deliver a unique and accurate verification solution for these advanced design projects.” The company says its new product complements design tools from all leading EDA vendors including Cadence, Mentor Graphics, Synopsys, and FPGA tools from Altera and Xilinx.
IMEC announced it has developed a “generic and versatile method” to synthesize stable, biocompatible magnetic nanoparticles. IMEC says by tuning the endgroups, the functionalized nanoparticles can be used for a wide variety of biomedical applications, including accurate drug delivery, improved diagnostics, and targeted cancer therapy.
Impinj announced availability of the company’s AEON/OTP nonvolatile memory (NVM) cores in the 90-nanometer manufacturing process at TSMC, which the company says makes Impinj “the first and only provider of one-time- and multiple-time-programmable (OTP and MTP) NVM cores in advanced logic CMOS processes.”
INC3, the third International Nanotechnology Conference, took place this week in Brussels with approximately 250 technologists and policy makers from around the world. They discussed developments in nanotechnology, the challenges and bottlenecks, the economic and societal implications and the need for collaboration across industry, academia, governments, and financial institutions. Per organizers, “The presentations emphasized that the multi-disciplinary skills and tasks needed for further nanotechnology innovations exceed the resources and capabilities of any single company, nation or region.”
Invarium announced “a leading U.S.-based semiconductor equipment manufacturer” has selected the company’s full-chip DimensionPPC technology for mask design and patterning process optimization. Per the press release, “the equipment manufacturer, rated one of the top 10 tool suppliers by VLSI Research, will use DimensionPPC to enable rapid back-end-of-the-line (BEOL) integration on its test ICs at the 45 and 32-nanometer nodes.
KLA-Tencor and Clear Shape Technologies announced they are collaborating on DFM solutions, “enabling design-aware photomask inspection at 45nm and below.” The collaboration involves KLA-Tencor's Terascan HR photomask inspection system and Clear Shape's Variability Platform products. Not surprisingly, “the two companies expect this collaboration to enable customers to achieve improved device yield and, ultimately, faster production ramp for the most advanced designs.”
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-- Peggy Aycinena, EDACafe.com Contributing Editor.
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