AUSTIN, Texas & ALBANY, N.Y. — (BUSINESS WIRE) — June 22, 2009
A lineup of recognized technical and manufacturing experts from SEMATECH
and International SEMATECH Manufacturing Initiative (ISMI) will offer a
series of lectures and workshop sessions from July 14-16, 2009 at
SEMICON West in San Francisco.
“More than ever, this year’s SEMICON West will be an important forum for
our industry to come together to find the best ways to address complex
technology challenges and to stay productive and profitable in a
challenging business climate,” said Dr. Michael Polcari, SEMATECH’s
President and CEO. “We look forward to meeting with industry colleagues
and sharing data, strategies, and best practices.”
The lineup features five expert speakers representing SEMATECH and its
subsidiary ISMI, who will appear on the Device Scaling TechXPOT Stage in
the North Hall of Moscone Center. Presented by the industry’s most
trusted sources in semiconductor R&D, topics will include CMOS scaling,
3D interconnects, extreme ultraviolet lithography, and ESH challenges.
The following speakers are scheduled:
Raj Jammy, SEMATECH’s vice president of Emerging Technologies,
“Materials and Device Challenges for 22 nm and Beyond Technologies,
and Manufacturing Considerations,” July 14 at 10:30 a.m.
Paul Kirsch, SEMATECH’s director of Front End Processes, “High-k
Dielectric Materials and Electrode Challenges for Advanced Logic and
Memory Technologies at 22 nm and Beyond,” July 14 at 3:00 p.m.
Sitaram Arkalgud, SEMATECH’s director of 3D Interconnect,
“Challenges in 3D TSV Technology,” July 14 at 3:20 p.m.
Tom Huang, ISMI’s ESH project manager, “Energy Reduction
Challenges for Semiconductor Fabs and ISMI’s Technology Center
Approach,” July 15 at 12:10 p.m.
Bryan Rice, SEMATECH’s director of Lithography, “EUV Readiness:
An Infrastructure-Based Perspective,” July 15 at 4:10 p.m.
Additionally, SEMATECH and ISMI will host three public workshops during
Equipment suppliers will share their plans on how new and existing
wafer metrology technologies can be used, modified, or enhanced to
measure and improve 3D interconnect processes at SEMATECH's 3D
Metrology Workshop on July 16 at 1:00 p.m. in the Yerba Buena
Salons (12 and 13), at the Marriott.
Co-organized with SEMI, ISMI’s e-Manufacturing Workshop and EDA
User Group will focus on the Equipment Data Acquisition interface
(Interface A). e-Manufacturing enabling implementation strategies on
the Interface A requirements will be presented to an audience of
chip-makers, equipment companies and software suppliers on July 16 at
1:00 p.m. in the Golden Gate (A2) Conference Room, at the Marriott.
The Energy Conservation Enabler Initiative Workshop, led by
SEMI and ISMI, is the first in a series of global meetings on energy
conservation. Participants will hear formal presentations and engage
in working group sessions to identify and agree on the primary
challenges in improving energy use in equipment and facilities on July
14 at 1:30 p.m. at the Marriott.
Some of SEMATECH’s and ISMI’s most prominent technologists in the
nanoelectronics industry will be attending SEMICON West. Interviews with
executives and technical experts are available upon request. To arrange
for meeting attendance or interviews, please contact
For over 20 years, SEMATECH® (
has set global direction, enabled flexible collaboration, and bridged
strategic R&D to manufacturing. Today, we continue accelerating the next
technology revolution with our nanoelectronics and emerging technology
Erica McGill, 518-956-7446