"Chris is one of the most respected and knowledgeable people in the field of lithography," said Roy Prasad, president and CEO of Invarium. "His impressive credentials coupled with a unique understanding of nanometer mask and pattern synthesis challenges will help us further extend our next-generation technology capabilities for 32nm and below. As we continue to set the pace in the area of patterning synthesis, Chris will be an invaluable resource for our R&D teams."
"As double patterning technology is rapidly becoming the most sought-after optical extension solution for 32nm, the winning strategy is going to be advanced RET/OPC based on precise physical models, not lumped empirical models," said Mack. "We need to focus on creating the most rigorous, compact models for 32nm and DPT. I am excited to work with Invarium to bring these solutions to the industry."
"As we push the boundaries of cost and physics in lithography today, variability in layout correction demands a new approach to patterning synthesis," said Apo Sezginer, co-founder and CTO of Invarium. "Chris has a deep understanding of the issues involved as we consider the very challenging tasks the industry is facing. His depth of knowledge in the modeling of resist technology and resist development, film stack interactions, reflectivity and data analysis make him the ideal choice for Invarium. There is no better model expert in the field than Chris."
Dr. Mack is recognized worldwide as a leading expert in lithography and lithographic process modeling. He has spent 25 years in the semiconductor industry, having served as vice president of lithography technology for KLA-Tencor; founder, president and CTO of FINLE Technologies; and lithography engineer for SEMATECH and the National Security Agency. Mack regularly teaches courses about lithography, training more than 2,000 lithographers from more than 200 different companies around the world over the past 20 years. He is an adjunct faculty member in the Electrical and Computer Engineering and Chemical Engineering Departments of the University of Texas at Austin. Mack is also an SPIE Fellow and winner of the 2003 SEMI Award. He has written several books and has four patents in the area of lithography.
Mack holds Bachelor of Science degrees in physics, chemistry, electrical engineering and chemical engineering from Rose-Hulman Institute of Technology; a Master of Science degree in electrical engineering from the University of Maryland; and a Ph.D. in chemical engineering from the University of Texas at Austin.
Invarium, Inc. provides advanced patterning synthesis solutions to the global semiconductor industry. The company's technology and solutions are geared to enable superior pattern accuracy on silicon for advanced IC designs, while accelerating time-to-volume production. The Invarium layout-to-mask solution represents a superior alternative to conventional RET/OPC tools and other layout correction techniques for process effects from mask through etch. Invarium is headquartered in San Jose, California, USA. www.invarium.com.
Editor Note: For a downloadable photo of Chris Mack, please visit www.lithoguru.com/about.html.
Editorial Contact: Sarmishta Ramesh The Hoffman Agency for Invarium 303-327-5459 Email Contact
Web site: http://www.invarium.com//