Leti and EVG Launch INSPIRE, a Lithography Program Aimed At Demonstrating Benefits of Nano-imprint Technology

GRENOBLE, France, and ST. FLORIAN AM INN, Austria – July 15, 2015 – CEA-Leti and EV Group have launched a new program in nano-imprint lithography (NIL) called INSPIRE to demonstrate the benefits of the versatile, powerful nano-patterning technology and spread its use for applications beyond semiconductors.

In addition to creating an industrial partnership to develop NIL process solutions, the INSPIRE program is designed to demonstrate the technology’s cost-of-ownership benefits for a wide range of application domains, such as photonics, plasmonics, lighting, photovoltaics, wafer-level optics and bio-technology. 

Leti and EVG will jointly support the development of new applications from the feasibility-study stage to supporting the first manufacturing steps on EVG platforms and transferring integrated process solutions to their industrial partners, thus significantly lowering the entry barrier for adoption of NIL for manufacturing novel products.

In its effort to support high-volume manufacturing applications, EVG recently launched the HERCULES® NIL equipment platform, and the INSPIRE program’s activities will complement the company’s efforts within the framework of its NILPhotonicsTM competence center that was launched in December 2014.

“EVG is excited about the value that the partnership with Leti in the INSPIRE program will provide to industry,” said Markus Wimplinger, corporate technology development and IP director at EV Group. “After more than a decade of research and development activities, EVG has propelled NIL technology to a level of maturity that enables significant advantages for certain applications compared to traditional optical lithography.”

After launching its NIL technology-development program more than 10 years ago, Leti oriented the use of this technology mainly for photonics applications. In early 2014, the program was integrated in the Silicon Technologies Division to establish a NIL collaborative program.

“Leti and EVG have a long history of collaborating on ways to bring new technologies to market at reasonable costs for the benefits of our customers,” said Laurent Pain, patterning program manager in Leti’s Silicon Technologies Division. Through INSPIRE, we will develop new ways for them to use this flexible,powerful nano-patterning technology to create new products for a wide range of applications.” 

About Leti (France)

As one of three advanced-research institutes within the CEA Technological Research Division, CEA Tech-Leti serves as a bridge between basic research and production of micro- and nanotechnologies that improve the lives of people around the world. It is committed to creating innovation and transferring it to industry. Backed by its portfolio of 2,800 patents, Leti partners with large industrials, SMEs and startups to tailor advanced solutions that strengthen their competitive positions. It has launched 54 startups. Its 8,500m² of new-generation cleanroom space feature 200mm and 300mm wafer processing of micro and nano solutions for applications ranging from space to smart devices. With a staff of more than 1,800, Leti is based in Grenoble, France, and has offices in Silicon Valley, Calif., and Tokyo. Follow us on www.leti.fr and @CEA_Leti.

About EVG (Austria)

EV Group (EVG) is a leading supplier of equipment and process solutions for the manufacture of semiconductors, microelectromechanical systems (MEMS), compound semiconductors, power devices and nanotechnology devices. Key products include wafer bonding, thin-wafer processing, lithography/nanoimprint lithography (NIL) and metrology equipment, as well as photoresist coaters, cleaners and inspection systems. Founded in 1980, EV Group services and supports an elaborate network of global customers and partners all over the world. More information about EVG is available at www.EVGroup.com

Press contact:
Leti Agency    
+33 6 74 93 23 47
Email Contact

EV Group (EVG) Marketing & Com     
+43 7712 5311 0      
Email Contact

 

 



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