Mentor Graphics Announces Complete Design through Manufacturing Solution in TSMC Reference Flow 10.0
WILSONVILLE, Ore. — (BUSINESS WIRE) — July 23, 2009
Mentor Graphics Corporation (NASDAQ:
) today announced that it has
expanded the set of Mentor tools and technologies included in TSMC
Reference Flow 10.0. The expanded Mentor® track supports advanced
functional verification for complex ICs, netlist-to-GDSII implementation
for 28nm ICs, tighter integration with the ubiquitous Calibre®
physical verification and DFM platform, and tools for layout aware test
failure diagnosis. In addition, this newly introduced Mentor track also
addresses low power design with Mentor tools for functional
verification, IC implementation and IC testing.
“Mentor Graphics continues to expand its Reference Flow offerings to
cover the total IC design cycle from the systems level through
functional verification, place-and-route, physical verification and
silicon test, as well as offering new solutions such as low power,
manufacturing variability, and silicon yield analysis,” said S.T. Juang,
senior director of Design Infrastructure Marketing at TSMC.
The Reference Flow 10.0 Mentor track provides new capabilities in many
areas, including the first Mentor implementation solution in TSMC
Reference Flow, the Olympus-SoC™
place-and-route system. For advanced IC implementation, the Olympus-SoC
system has new features addressing on-chip variation, 28nm routing and
low power design:
Advanced stage-based OCV analysis and optimization – Setting different
stage-based OCV values helps reduce pessimism and enables faster
N28 routing rules – Provides 28nm support for the complete
netlist-to-GDSII flow, including support for the 28nm transparent
Disjoint power domain – Supports multiple floor plans in the same
voltage domain to minimize congestion and reduce the need for
UPF hierarchical low power automation – Provides both top-down and
bottom-up support for UPF-based, low-power designs giving designers
Design-for-Manufacturing capabilities within the Olympus-SoC and Calibre
platforms have been expanded and more tightly integrated to address
manufacturing variability issues at 28nm and beyond:
Litho hotspot fixing – Improves yield by enabling the Olympus-SoC
place-and-route tool to automatically fix litho hotspots detected by
the Calibre LFD™ tool.
Quick convergence of DMx fill for timing and ECOs – The Olympus-SoC
system invokes the Calibre CMPAnalyzer tool (which works with TSMC’s
VCMP simulator) to analyze thickness variation for its impact on
timing. The Olympus-SoC tool also supports hierarchical, incremental
and timing-driven metal fill flows, significantly improving yield and
Cell-index-aware placement – Reduces congestion and speeds routing by
allotting more room for cells with difficult pin access.
Electrical DFM – The Calibre xRC™ and Calibre CMPAnalyzer products are
integrated to allow simulated thickness information to be incorporated
into parasitic extraction results to drive accurate circuit
simulation. This also provides a solution for more efficient corner
simulation and statistical analysis by providing statistical parasitic
information to the Mentor Eldo® circuit simulator.
In addition, the Calibre nmDRC and Calibre nmLVS products support
signoff physical verification of 2D and 3D system in package (SIP)
designs in Reference Flow 10.0.
Reference Flow 10.0 includes new features in the TestKompress® and
YieldAssist™ products for better fault detection, power-aware testing
and failure diagnosis:
Embedded multiple detect ATPG – Increases bridge fault detection
without any increase in pattern size or test time.
Layout aware diagnosis – Eliminates false bridge/open suspects,
enhances diagnosis resolution, and builds a foundation for effective
Low-power ATPG – Reduces power during all phases of scan test
utilizing a constant-fill decompressor and power-aware control of
existing clock gates.
Reference Flow 10.0 also includes advanced functional verification
features from the Questa® and 0-In® platforms for improved validation of
complex IC designs.
Standards-based solution featuring support for IEEE Std. 1801-2009™
UPF and IEEE Std. 1800-2005™ SystemVerilog.
Integrated low-power simulation and formal capabilities that verify
advanced power management circuitry early in the design flow.
Static and dynamic verification of complex clock domain crossing
circuits to ensure proper operation in standard and low power modes.
“The complete Mentor design-to-silicon track in TSMC’s Reference Flow
10.0 allows us to address our mutual customers’ biggest challenges for
28nm, including low power design and verification, large-scale SoC
implementation, manufacturing variability, and cost-effective test and
yield analysis,” said Walden C. Rhines, chairman and CEO, Mentor
Graphics. “The industry transition to 28nm processes also presents new
technical challenges, which Mentor is in a unique position to solve. Our
close collaboration with TSMC allows us to close the loop between
designers and foundries with tools that help our customers get their
products to market faster with higher performance and greater
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ:
MENT) is a world leader in
electronic hardware and software design solutions, providing products,
consulting services and award-winning support for the world’s most
successful electronics and semiconductor companies. Established in 1981,
the company reported revenues over the last 12 months of about $800
million and employs approximately 4,425 people worldwide. Corporate
headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon
97070-7777. World Wide Web site:
(Mentor Graphics, Mentor, 0-In, Calibre, Eldo, Questa and TestKompress
are registered trademarks and LFD, Olympus-SoC, xRC and YieldAssist are
trademarks of Mentor Graphics Corporation. All other company or product
names are the registered trademarks or trademarks of their respective
Gene Forte, 503-685-1193