Mentor Graphics Aligns with UMC to Validate the Accuracy of Calibre nmDRC Physical Verification UMC 65nm Deck

WILSONVILLE, Ore.—(BUSINESS WIRE)—April 29, 2008— Mentor Graphics Corporation (Nasdaq:MENT) today announced that it has worked with leading foundry UMC to validate the accuracy of UMCs 65nm physical verification flows using the Calibre nmDRC product. Using one of UMCs advanced 65nm customer products as the test design, the cooperative effort verified that UMCs 65nm Calibre production decks accurately reflect the design rule manual for this node, providing UMC customers with even greater confidence in the manufacturability of their 65nm chip designs.

Because the Calibre tools performance and accuracy are highly valued by UMC customers, it is the first available for each new technology node, and is used internally by UMCs engineering groups. UMC and Mentor Graphics previously partnered to demonstrate the superior performance of the Calibre nmDRC product with Hyperscaling as announced in the Mentor Graphics Calibre nmDRC Adopted by UMC to Address Shifting Requirements for Sign-off, press release on July 16, 2006 (see

The accuracy evaluation performed by UMC and Mentor Graphics proves that our customers have access to a leading EDA source for optimal design verification speed as well as a highly accurate verification flow, said Lee Chung, vice president of global marketing at UMC. As we were able to validate the accuracy of our advanced decks and optimize them for speed, we are providing customers with proven accuracy and performance solutions created to help get their designs to market faster.

Mentor verification tools are available as part of UMCs Foundry SoC Solutions, which include other comprehensive EDA and design support resources that complement the foundrys leading-edge process technologies. UMCs 65nm technology is currently in volume production at the companys two 300mm fabs for a variety of customer products.

Calibre customers can take advantage of the huge nmDRC performance leap by simply qualifying the latest release realizing great performance for nanometer IC designs, and benefiting from the focus of UMCs latest verification flow development efforts, said Joe Sawicki, vice president and general manager for the design-to-silicon division at Mentor Graphics. Upgrading to the Mentor nm Platform also enables customers to establish a comprehensive DFM flow with Mentor tools for critical area analysis and reduction, CMP analysis with intelligent fill, litho process checking and enhancement, design-for-test, and rapid yield learning based on volume test data.

Calibre nmDRC is an important component of the overall Calibre nm Platform that provides customers superior solutions for DRC, LVS, extraction, critical area analysis (CAA), critical feature analysis (CFA), chemical mechanical polishing (CMP), and litho friendly design (LFD) analysis all required to solve yield challenges of the nanometer era.

About Mentor Graphics

Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the worlds most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $875 million and employs approximately 4,350 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site:

(Mentor Graphics and Calibre are registered trademarks, and LFD and OPCverify are trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)


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