Self-Compensating Design for Focus Variation - Technical Paper from DAC 2005

Blaze DFM Inc.

Paper by Puneet Gupta, Andrew B. Kahng, Youngmin Kim , and Dennis Sylvester.

Process variations have become a bottleneck for predictable and highyielding IC design and fabrication. Linewidth variation (∆L) due to defocus in a chip is largely systematic after the layout is completed, i.e., dense lines “smile” through focus while isolated (iso) lines “frown”. In this paper, we propose a design flow that allows explicit compensation of focus variation, either within a cell (self-compensated cells) or across cells in a critical path (self-compensated design). Assuming that iso and dense variants are available for each library cell, we achieve designs that are more robust to focus variation. Design with a self-compensated cell library incurs ~11-12% area penalty while compensating for focus variation. Across-cell optimization with a mix of dense and iso cell variants incurs ~6-8% area overhead compared to the original cell library, while meeting timing constraints across a large range of focus variation (from 0 to 0.4um). A combination of original and iso cells provides an even better self-compensating design option, with only 1% area overhead. Circuit delay distributions are tighter with self-compensated cells and self-compensated design than with a conventional design methodology.


Read the complete story ...


Review Article Be the first to review this article
Synopsys: Custom Compiler


Featured Video
Editorial
Peggy AycinenaIP Showcase
by Peggy Aycinena
Grant Pierce: Grand Challenges in IP
More Editorial  
Jobs
LVS PEX DESIGN ENGINEERS SILICON VALLEY for EDA Careers at San Jose, CA
LVS for PDK Design Engineer SILICON VALLEY for EDA Careers at San Jose, CA
Technical Support Engineer for EDA Careers at Freemont, CA
Upcoming Events
Automotive E/E Architecture China Conference at Shanghai China - May 25 - 26, 2017
EMC PCB Design Integration at 13727 460 Ct SE North Bend WA - Jun 6 - 9, 2017
DAC 2017 Conference at Austin TX - Jun 18 - 22, 2017
2017 FLEX Conference at Monterey Conference Center 1 Portola Plaza, Monterey CA - Jun 19 - 22, 2017
ClioSoft
DAC2017



Internet Business Systems © 2017 Internet Business Systems, Inc.
595 Millich Dr., Suite 216, Campbell, CA 95008
+1 (408)-337-6870 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering TechJobsCafe - Technical Jobs and Resumes GISCafe - Geographical Information Services  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy Policy