Midnight at the OASIS


- Achieve at least an order-of-magnitude file size improvement compared to GDSII Stream.

- Remove all 16-bit and 32-bit integer width restrictions-make the new format fully 64-bit capable.

- Efficiently represent cells with large payloads of flat native geometric figures.

- Provide a richer information palette to facilitate interchange of layout-related information between design and manufacturing.

In the months leading up to the formation of the SEMI Data Path Task Force, International Sematech sponsored a series of meetings focusing on Mask EDA issues. Many of the Task Force participants were also involved in these Sematech meetings, and carried forward much useful information from those sessions into the definition of this specification. This format is designed primarily to encapsulate hierarchical mask layout for interchange between systems such as EDA software, mask writing tools, and mask inspection/repair tools. This format is designed to be both hardware- and software-independent. NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use. Use of extension records such as XNAME, XELEMENT, and XGEOMETRY may impair interoperability between tools. It is recommended that these extensions be used primarily for prototyping, and that interoperability be maintained through the formal inclusion of extensions to this specification.


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Editor's Note:

J. Tracy Weed, PhD, earned his BS and MS in structural inorganic chemistry from the University of Connecticut and his PhD from the University of California at Riverside in the area of synthetic organo-metallic chemistry.

Tom Grebinski, CEO of Oasis Tooling Inc. and chairman of the Semiconductor Equipment and Materials International (SEMI) data path task force, holds a BS from Michigan Technological University. Two years later he founded a company based on his patented technology to treat and etch semiconductor surfaces. He has served in semiconductor microelectronics for 24 years in various executive for companies domestic and international, private and publicly held.

Steffen Schulze, PhD, is the product manager for the Calibre mask data preparation tools at Mentor Graphics. He worked at the Center for Microelectronics in Dresden, Germany. He received a PhD in electrical engineering from the Institute for Microsensors at the University of Bremen in Germany.

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