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Mentor Graphics Collaborates With GLOBALFOUNDRIES to Provide Easier Debugging Capability to IC Designers
WILSONVILLE, OR -- (MARKET WIRE) -- Aug 26, 2010 -- Mentor Graphics Corporation ( "The manufacturing variability issues of advanced process nodes has led to an exponential explosion in the complexity of design rules, resulting in longer physical verification debugging cycles," said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES. "To counteract this trend, GLOBALFOUNDRIES is investing in unique capabilities aimed at helping GLOBALFOUNDRIES customers get to market more quickly. Our GDRM effort with Mentor is a good example of how our collaboration with ecosystem partners addresses specific bottlenecks and improves the overall design-to-silicon flow." "To make it easier for the industry to take advantage of advanced processes such as those being offered by GLOBALFOUNDRIES, we're striving to make all facets of design enablement more seamless and productive," said Michael Buehler-Garcia, director of marketing for Calibre design-side products at Mentor Graphics. "Cooperation to make DRC debug a faster and simpler process for custom designers is just one example of Mentor's and GLOBALFOUNDRIES' commitment to providing real-world solutions to the foundry ecosystem." The Calibre RVE integration with GLOBALFOUNDRIES' GDRM is being shown in the Mentor booth at the Global Technology Conference on September 1 in Santa Clara, California. For more information on GTC 2010, visit: http://www.globalfoundries.com/gtc2010/.
About Mentor Graphics
(Mentor Graphics and Calibre are registered trademarks and RVE is a trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)
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For more information, please contact: Gene Forte Mentor Graphics 503.685.1193 Email Contact Sonia Harrison Mentor Graphics 503.685.1165 Email Contact Be the first to review this article
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