Mentor Graphics Customers Expand Use of Calibre Pattern Matching to Tackle Toughest IC Verification and Manufacturing Problems

WILSONVILLE, Ore., June 1, 2016 — (PRNewswire) —

Highlights:

  • Customers and ecosystem partners are expanding use of the Calibre® Pattern Matching solution to overcome complex integrated circuit (IC) verification and manufacturing problems.
  • The solution integrates all Calibre tools and flows to drive new applications in physical verification, design for manufacturability (DFM), yield enhancement, and failure analysis.
  • In use across a wide range of IC design companies, process technologies, and foundries, including eSilicon, Samsung Foundry and SMIC.
Calibre(R) Pattern Matching technology is integrated into the Mentor(R) Calibre nmPlatform solution to help customers overcome complex integrated circuit (IC) verification and manufacturing problems.

Mentor Graphics Corporation (NASDAQ: MENT) today announced that customers and ecosystem partners are expanding their use of Calibre Pattern Matching solution to overcome previously intractable IC verification and manufacturing problems. The solution is integrated into the Mentor® Calibre nmPlatform solution, creating a synergy that drives these new applications at IC design companies and foundries, across multiple process nodes.

Calibre Pattern Matching technology supplements multi-operational text-based design rules with an automated visual geometry capture and compare process. This visual approach is both very powerful in its ability to capture complex pattern relationships, and to work within mixed tool flows, making it much easier for Mentor customers to create new applications to solve difficult problems. Because it is integrated into the Calibre nmPlatform toolset, the Calibre Pattern Matching functionality can leverage the industry-leading performance and accuracy of all Calibre tools and flows to create new opportunities for design-rule checking (DRC), reliability checking, DFM, yield enhancement, and failure analysis.

"Our customers count on eSilicon's design services, IP, and ecosystem management to help them succeed in delivering market-leading ICs," said Deepak Sabharwal, general manager, IP products & services at eSilicon. "We use Calibre Pattern Matching to create and apply a Calibre-based yield-detractor design kit that helps identify and eliminate design patterns that impact production ramp-up time."

Since its introduction, use models for Calibre Pattern Matching technology have rapidly expanded, solving problems that were previously too complex or time-consuming to be implemented. New use cases include the following:

  • Physical verification of IC designs with curved structures—for analog, high-power, radio frequency (RF) and microelectromechanical (MEMS) circuitry—is extremely difficult with products designed to work with rectilinear design data. Calibre customers are automating that verification using a combination of Calibre Pattern Matching technology and other Calibre tools for much greater efficiency and accuracy, especially when compared to manual techniques.
  • Calibre Pattern Matching technology can be used to quickly locate and remove design patterns that are known or suspected of  being difficult to manufacture ("yield detractors"). Foundries or design companies create libraries of yield detractor patterns that are specific to a process node or a particular design methodology. Samsung Foundry used this approach in its Closed-Loop DFM solution to help its customers ramp to volume faster, and reduce process-design variability.
  • Some customers use Calibre Pattern Matching technology with Calibre Auto-Waivers™ functionality to define a specific context for waiving a DRC violation. This enhancement allows for automatic filtering of those violations for significant time savings and improved design quality.

"To help our customers create manufacturing-ready designs, we use Calibre Pattern Matching to create and use a yield detractor database to fix most of the litho hotspots in the block level. Then we perform fast signoff DFM litho checking at the chip level using an integrated solution with Calibre Pattern Matching and Calibre LFD" said Min-Hwa Chi, senior vice president, SMIC. "By offering a solution for manufacturability robustness that is built on the Calibre platform, we are seeing ready customer adoption of SMIC's DFM solution."

With the Calibre Pattern Matching tool, design companies can now optimize their physical verification checking to their unique design styles. The tool is easy to adopt because it doesn't rely on expertise in scripting languages. Instead, any engineer can readily define a visual pattern that captures the designer's expertise in the critical geometries and context for that configuration. 

"With the growing adoption of Calibre Pattern Matching technology, Mentor continues to help our customers address increasing design complexity, regardless of the process node they are targeting," said Joe Sawicki, vice president and general manager of the Design-to-Silicon division at Mentor Graphics. "By incorporating the Calibre Pattern Matching tool, the Calibre platform becomes an even more valuable bridge between design and manufacturing for the ecosystem."

At the 2016 Design Automation Conference, Mentor has a Calibre Pattern Matching presentation on Tuesday, June 7 at 3PM in the Mentor booth #949. Register for the session using the registration form.

About Mentor Graphics

Mentor Graphics Corporation is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues in the last fiscal year of approximately $1.18 billion. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. Web site: http://www.mentor.com/.

For more information, please contact:
David Smith
Mentor Graphics
503.685.1135
Email Contact

Mentor Graphics, Mentor, and Calibre are registered trademarks, and Pattern Matching and Auto-Waivers are trademarks, of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.

Mentor Graphics logo.

Photo - http://photos.prnewswire.com/prnh/20160531/373865

Logo - http://photos.prnewswire.com/prnh/20140317/AQ83812LOGO

 

To view the original version on PR Newswire, visit: http://www.prnewswire.com/news-releases/mentor-graphics-customers-expand-use-of-calibre-pattern-matching-to-tackle-toughest-ic-verification-and-manufacturing-problems-300277577.html

SOURCE Mentor Graphics Corp.

Contact:
Mentor Graphics Corp.
Web: http://www.mentor.com




Review Article Be the first to review this article

EMA:

Featured Video
Editorial
Peggy AycinenaWhat Would Joe Do?
by Peggy Aycinena
Retail Therapy: Jump starting Black Friday
Peggy AycinenaIP Showcase
by Peggy Aycinena
REUSE 2016: Addressing the Four Freedoms
More Editorial  
Jobs
Manager, Field Applications Engineering for Real Intent at Sunnyvale, CA
FAE FIELD APPLICATIONS SAN DIEGO for EDA Careers at San Diego, CA
Development Engineer-WEB SKILLS +++ for EDA Careers at North Valley, CA
ACCOUNT MANAGER MUNICH GERMANY EU for EDA Careers at MUNICH, Germany
AE-APPS SUPPORT/TMM for EDA Careers at San Jose-SOCAL-AZ, CA
Upcoming Events
Zuken Innovation World 2017, April 24 - 26, 2017, Hilton Head Marriott Resort & Spa in Hilton Head Island, SC at Hilton Head Marriott Resort & Spa Hilton Head Island NC - Apr 24 - 26, 2017
CST Webinar Series



Internet Business Systems © 2016 Internet Business Systems, Inc.
595 Millich Dr., Suite 216, Campbell, CA 95008
+1 (408)-337-6870 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering TechJobsCafe - Technical Jobs and Resumes GISCafe - Geographical Information Services  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy Policy