90m2 Leti Booth to Help Highlight Grenoble Tech Ecosystem at SEMICON Europa

 Grenoble Hosting SEMICON Europa Oct. 7-9,
First Time Event Held in France

Leti’s 90-square-meter Booth Will Feature Portable Showroom
To Demonstrate New Technology Innovations

GRENOBLE, France – Sept.24, 2014 – Grenoble, the center of one of Europe’s key microelectronics ecosystems, is hosting SEMICON Europa 2014 Oct. 7-9.

This is the first time France has hosted the premier annual event for the European chip industry, which achieved a 7.9 percent market growth during the first semester of 2014, according to WSTS association. SEMI, the global trade organization that organizes the SEMICON gatherings, will alternate SEMICON Europa every other year between Dresden and Grenoble beginning this year.

The event in the ALPEXPO Congress Center is expected to draw more than 6,000 visitors and 400 companies, and will help showcase the Grenoble-Isère region’s strong microelectronics ecosystem, including worldwide microelectronics suppliers, leading R&D institutes, world-class universities and critical mass of tech companies.

As one of the event’s supporters, Leti is staging a 90-square-meter booth (number 1360 in the Science Park) to highlight its R&D themes of silicon technology, imaging/photonics/display, embedded systems, design, health and security. The booth with feature Leti’s mobile showroom, which demonstrates some of the exhibits on display in Leti’s permanent showroom on the MINATEC Campus.

Representatives from IRT Nanoelec, which includes 18 public- and private-sector research partners, will also be at the booth to present how industrials from all sectors can benefit from the rich technological offering of the Grenoble ecosystem.

In addition, Leti experts in fields ranging from low-power multiprocessing to future lithography options will present their insights and outlook in 10 sessions. Four sessions will be chaired by Leti.

Times and places/Leti speakers

Tuesday, Oct. 7

Nanoelectronics for Healthcare Session, TechARENA 1, ALPEXPO                                          
10:15 a.m. Introduduction - Didier Louis, session chair and Leti international communication manager             
11:40 a.m. Microsensors for Health Applications, Eric Gouze, Leti business development manager
Low Power Conference: Highly Energy Efficient Nanotechnologies and Applications, Room Meije 2+3, ALPEXPO                                                    
Session 3, Processors        
4:20 p.m. Low-power Multiprocessing - Fabien Clermidy, senior expert, CEA-LETI                            
Session 4, Energy-efficient Design Techniques                                                  
5:10 p.m., Fabien Clermidy, chair

Wednesday, Oct. 8

Imaging Conference, Room Sept Laux 4+5, ALPEXPO                                                             

Session 3, Consumer                                                                                  
10:25 a.m. Spectral Filtering on CMOS Image Sensors with Metal Dielectric Multilayers, Laurent Frey, Leti senior research scientist
Session 5, Industrial and Professional                                                             
2 p.m. Introduction, Bruno Mouray, session chair and vice president of Leti’s Optic and Photonics Division

3D-Integration Session, TechARENA 1, ALPEXPO

3:20 p.m. Technological Challenges and Applications of 3D Sequential Integration, Claire Fenouillet-Béranger, Leti senior scientist

Power Electronics Conference: the Ultimate Path to CO2 Reduction, Room Meije 2+3, ALPEXPO

Session 1, Applications
3:05 p.m. GaN on Silicon: A Way to Low-cost Power Devices, Jean-Jacques Aubert, Leti program manager for power electronics

16th European Manufacturing Test Conference, TechARENA 2, ALPEXPO, 4 p.m.

Panel Discussion: Gaining a European Competitive Edge through Test Innovation       

Alain Toffoli, Leti electrical characterization research engineer

Thursday, Oct. 9

Lithography Session: What Are the Lithography Options for Tomorrow?, TechARENA 1, ALPEXPO                                                                                                          

12 p.m. Introduction, Serge Tedesco, session chair and Leti lithography program manager              
12:30 p.m. Maskless Lithography for Volume Manufacturing, Ludovic Lattard, Leti laboratory deputy manager

About CEA-Leti

By creating innovation and transferring it to industry, Leti is the bridge between basic research and production of micro- and nanotechnologies that improve the lives of people around the world. Backed by its portfolio of 2,200 patents, Leti partners with large industrials, SMEs and startups to tailor advanced solutions that strengthen their competitive positions. It has launched more than 50 startups. Its 8,000m² of new-generation cleanroom space feature 200mm and 300mm wafer processing of micro and nano solutions for applications ranging from space to smart devices. Leti’s staff of more than 1,700 includes 200 assignees from partner companies. Leti is based in Grenoble, France, and has offices in Silicon Valley, Calif., and Tokyo. Visit www.leti.fr for more information.

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