Carl Zeiss and Synopsys Cooperate in Critical Dimension Metrology

Carl Zeiss and Synopsys have released a new data preparation output module for accurately measuring of critical dimensions (CD) in photomasks using the metrology tool WLCD.

JENA, Germany — (BUSINESS WIRE) — November 29, 2012Carl Zeiss and Synopsys have released a new output module for CATS™, a solution for data preparation for mask metrology, supporting the ZEISS WLCD tool. The solution offers mask shops a powerful capability for ensuring tight control over CD uniformity in photomasks. While the ZEISS WLCD tool measures the CD in the aerial image, the new CATS output module enables the engineer to mark the measurement sites for WLCD. The result is improved productivity for users in ensuring correct CD uniformity which is necessary for high manufacturing yield in silicon fabrication process.

"Applying CATS as mask data preparation software allows users a seamless integration of high precision CD measurements using the WLCD metrology system in their workflow ." states Ute Buttgereit, Senior Product Manager WLCD at Carl Zeiss SMS GmbH. “Users working with WLCD benefit from significantly improved efficiency in generating error-free input data and enables them to perform high precision CD measurement.”

"Synopsys is making a continued effort to provide comprehensive support for mask manufacturing. Our collaboration with Carl Zeiss can bring a powerful CD metrology capability to customers," said Fabio Angelillis, vice president of engineering for the silicon engineering group at Synopsys. “To achieve good yields in silicon fabrication it is critical that the photomasks are of highest quality and this solution delivers on this objective.”

The WLCD measures the critical dimension on photomasks under scanner relevant illumination conditions with high throughput. Proven aerial imaging technology is used to qualify the printing performance of the mask.

CATS is the industry’s leading solution for data preparation for mask lithography, inspection and metrology. Used in most advanced technology mask shops, CATS delivers superior quality of results in fractured data while offering fast throughput on standard compute clusters. After ZEISS PROVE® mask registration and overlay system, WLCD is the second metrology tool running with a CATS output module.


Leila Hammad, Carl Zeiss, Semiconductor Manufacturing Technology
Phone: +49 3641 64-2242
E-mail: Email Contact

Review Article Be the first to review this article
CST Webinar Series


Featured Video
Manager, Field Applications Engineering for Real Intent at Sunnyvale, CA
Upcoming Events
SEMICON Europe at Grenoble France - Oct 25 - 27, 2016
ARM TechCon 2016 at Santa Clara Convention Center Santa Clara CA - Oct 25 - 27, 2016
Call For Proposals Now Open! at Santa Clara Convention Center, Santa Clara, CA California CA - Oct 25 - 27, 2016
DeviceWerx - 2016 at Green Valley Ranch Casino & Resort Las Vegas NV - Nov 3 - 4, 2016
S2C: FPGA Base prototyping- Download white paper

Internet Business Systems © 2016 Internet Business Systems, Inc.
595 Millich Dr., Suite 216, Campbell, CA 95008
+1 (408)-337-6870 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering TechJobsCafe - Technical Jobs and Resumes GISCafe - Geographical Information Services  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy Policy