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Traditional on-chip-variation (OCV) using a constant derating factor may impose unnecessary performance penalties on nanometer designs. These penalties include reduced performance, larger die sizes, and longer design cycles. Incentia has introduced an advanced OCV approach since 2007 [1]. The advanced OCV uses variable derating factors based on logic level and physical location and selects the optimal derating factor for each timing path. This results in fewer timing violations, and allows design teams to rapidly achieve timing closure. As process technology continues to shrink, new features have been constantly added to the advanced OCV. These new features help designers tape out designs from 90nm, 65nm, to 40nm and even the technologies below. This paper will first goes through the OCV issues and review the basic concept of advanced OCV. Then, it describes the newly developed features over the years in details.
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