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It has been widely accepted that to ensure good yield in IC wafer manufacturing, early adaptation of DFM (Design for Manufacturability) guidelines in design phase is required and it is particularly true in Foundry business. Integrated foundry approaches for DFM guideline development were presented in this paper. With emphasis of process variations and process sensitivity impact on design patterns, we describe the procedure of the combination of rule-based and simulation-based lithographical hotspot pattern characterizations.
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