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Posts Tagged ‘statistical variation’

ProPlus: DFY solution unveiled

Thursday, November 1st, 2012

 

The leadership of ProPlus Design Solutions has a long history in EDA, although the company itself is a newly launched startup. Ten years ago, the majority of the leadership were involved in Celestry Design Technologies, Inc., while 5 years ago all of today’s ProPlus executive team were at Cadence. Today the company, based in Silicon Valley, is building on those many years of experience to make inroads in the demanding market for design-for-yield tools.

In late September, ProPlus released its newest product offering, NanoYield for yield prediction and design optimization. When I spoke with Dr. Zhihong Liu, Executive Chairman of the company, he touched on the history of ProPlus and explained the intent of NanoYield.

Per Liu, “ProPlus has foundation technology in modeling that goes back to Celestry, a company acquired by Cadence in 2003. When the team bought the technology out of Cadence, they founded ProPlus and [worked to create] a unique DFY solution, design for yield.

“Before I joined ProPlus two years ago, they were developing lines of technologies for both high-performance parallel modeling and circuit simulation/analysis with true SPICE accuracy. Now we have put everything together to provide an integrated solution for designing better circuits in shorter time, including modeling, simulation and multivariate statistical analysis. No one else in the industry is addressing all three of these together.

“One technology that was originally licensed from IBM is a multivariate High-Sigma solution. We put that together with our own industry-validated solution, and now provide the only integrated solution in the industry, NanoYield.”

(more…)




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