Posts Tagged ‘EDA Consortium’
Thursday, August 20th, 2015
As you all know, the Kaufman Award is presented every 12 to 18 months by the EDA industry, with support from the EDA Consortium and the IEEE Council on EDA.
Year in and year out, an individual from industry or academia is honored for providing a “demonstrable impact on electronic design through contributions in the field of EDA,” an impact in business, or industry direction and promotion, or technology and engineering, or education and mentoring.
Based on those parameters, in recent years we’ve seen luminaries such as Dr. Lucio Lanza, Dr. Chenming Hu, Dr. C.L. Liu, Mr. Pat Pistilli, Dr. Randy Bryant, and Dr. Aart de Geus receive this highly coveted commendation in reflection of their hard work, innovation, and dedication to EDA.
Now the fall of the year is upon us, and even though there is no date as yet posted to the EDAC website to indicate which day and hour in November this year’s Kaufman Award will be presented, or to whom, it’s a good guess the info will not be long in coming. It’s my hope that when the news does break, the answer will be Dr. Walden C. Rhines.
Wednesday, January 22nd, 2014
Before there was EDAC, there was IDAC. But before there was IDAC, there was just DA – Design Automation without Community or Consortium. The EDA industry consisted of a small number of large companies controlling the conversation, and a larger number of smaller companies who thought that if they linked hands they could do it better. It was Rick Carlson and Dave Millman who decided in 1986 to bring that group of small companies together to create IDAC, which stood for Independent Design Automation Companies.
According to Carlson, speaking on a recent phone call, “We wanted to get the small independent companies to work together in a cooperative way to deliver a solution, a flow, that was equal to or better than the big companies. And because even then, the leading-edge algorithms always came out of these small startups, we thought we had good solutions that the customers would appreciate.
“But there was a deeper, more fundamental issue that we hoped to solve by creating IDAC and that was how to grow the industry and foster innovation, whether in through a startup or an established player.”
Things didn’t work out exactly like Carlson and Millman had hoped for.
Wednesday, October 16th, 2013
Several years ago, after a phone briefing about a new product launch, I received a call back from the PR counsel who had organized the meeting. She asked me if I had all the info I needed regarding the product and the company. I said yes, and offered a minor apology for asking too many pointed questions of the marketing manager during the interview.
She said, “Oh, that’s okay. Talking to you is like talking to Aart de Geus. It’s clear you both think you’re the smartest guy in the room.”
That comment has come to mind multiple times since then, for two reasons. One, you never really know what impression you leave with people until it comes out at some capricious moment. And two, Aart de Geus isn’t the smartest guy in the room, just because he thinks so. He’s the smartest guy in the room, because he really is the smartest guy in the room.
That’s particularly applicable today with the EDAC event celebrating the 50th Anniversary of the EDA industry about to commence this evening in Silicon Valley. Per the Consortium, a plethora of industry luminaries will be in attendance. Per this writer, none will be more luminary than Dr. de Geus. If you’re reading this, you’re probably pretty well versed in both the history of EDA and the history of Aart de Geus. Nonetheless, here’s the latter in a nutshell.
Thursday, January 10th, 2013
EDA veteran Dr. Walden Rhines, Mentor Graphics CEO & Board Chairman, is one of the keenest and most optimistic observers of the industry. We spoke this week about the recent EDAC Market Statistics Service [MSS] numbers for Q3 2012.
Per Rhines: “EDA is growing at a rate almost a percentage greater than a year ago and most strongly in the Asia Pacific region, while also growing in other regions as well. [Only] Japan is not growing.”
He said there is growth in all product areas, but the “biggest growth is in the areas of new methodologies. ESL is very strong, and interestingly on the PCB side [growth was seen in] analysis tools such as signal integrity. But packaging is also growing, strongly consistent [with growth] in the new methodologies.”
Rhines also noted that CAE strength was largely influenced by growth in hardware-assisted verification (a.k.a. emulation), as well as the already mentioned ESL design.
“There’s actually healthy growth in everything,” he said, “except design verification and physical design and verification, which are both a little bit down. That’s largely caused by place-and-route, although detailed layout continues to be strong. [To be specific], the big category in physical design and verification is fine, and yield enhancement is fine, but standard place-and-route is weaker. If I had to come up with a reason, everything tends to have its ups and downs, so [in the long run] even place-and-route is still a good growth area.”
Thursday, April 19th, 2012
If you’re interested in start-ups, if you think you’ve got what it takes to plunge in and do the deed, the EDA Consortium has something you’re going to want to attend.
Starting on May 31st – that’s in about 5 weeks – EDAC will be offering a series of evening discussions about various “concepts and best practices for emerging companies.”
The series is going to be hosted by long-time EDA player, Jim Hogan. And as you all know, what Jim Hogan doesn’t know about EDA, start-ups, venture capital, and everything in between, simply isn’t worth knowing – so you’re sure to be in the best of hands with Jim moderating these meetings.
Of course, you don’t just have to be a new, up-and-coming entrepreneur to plan to benefit from the series, because EDAC says: “the content is geared to founders and executives of software, systems, and semiconductor companies, as well as others interested in getting a birds-eye view of what companies face at the various stages of success.”