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Archive for the ‘Mentor’ Category

DesignCon 2012: New HyperLynx Release 8.2 with Thermal / Power Co-simulation Analysis

Monday, February 13th, 2012

Steven McKinney from Mentor Graphics gave an update on the new HyperLynx Release 8.2 with thermal / power co-simulation analysis at DesignCon 2012.

Steven is a business development manager for Mentor Graphic’s Board System Division where he supports Mentor’s PCB analysis technologies which include tools for Signal Integrity, Power Integrity, Thermal and EMC design. Steven has previously held roles in technical marketing at Mentor Graphics, specializing in signal integrity and EMC analysis tools and educating the engineering community on signal integrity, power integrity, and EMC design issues. Prior to working for Mentor, Steven was a signal integrity engineer at Dell Computer developing server hardware. Steven received his BSEE and MSEE from North Carolina State University.

Calibre InRoute: Signoff Metal Fill Insertion, CMP Impact and Olympus Timing Analysis

Friday, February 10th, 2012

This presentation is by Benny Winefeld, Product Engineering Manager, Place and Route Division at Mentor Graphics.    By using Calibre InRoute, the effects of metal fill insertion and CMP on routing and signal timing can be analyzed for a physical design from within the Olympus environment.

Calibre InRoute – Signoff Litho (LFD) Analysis and Automated Repair

Thursday, February 9th, 2012

This presentation is by Benny Winefeld, Product Engineering Manager, Place and Route Division at Mentor Graphics.    By using Calibre InRoute, sign-off lithography (LFD) analysis and automatic repair can be done for a physical design from within the Olympus environment.

Manufacturing Closure for Advanced Node Designs within Place and Route

Wednesday, February 8th, 2012

Mentor Graphics developed Calibre InRoute to support manufacturing closure for advanced node designs by bringing Calibre signoff capabilities into the place and route environment.

This short video provides an overview of the Calibre InRoute solution.

Computational Lithography Solutions for 22nm and Beyond

Tuesday, February 7th, 2012

Mentor Graphics is committed to being the leader in computational lithography solutions for 22nm and beyond.  This video presentation discusses the challenges and necessary solutions for IC success.

 

Tutorial: Better PCB Power Design with DC Drop Analysis

Monday, February 6th, 2012

DC Drop Analysis is a crucial step in any PCB design flow. Learn how utilizing DC Drop Analysis can greatly enhance your ability to identify potential power issues. Explore how co-simulating DC Drop and Thermal Analyses can optimize your entire power delivery network.

Presented by Steve McKinney of Mentor Graphics

 

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