SAIT (Samsung Advanced Institute of Technology) Purchases SUSS MA200Compact Mask Aligner for the Manufacture of MEMS and Display Devices
[ Back ]   [ More News ]   [ Home ]
SAIT (Samsung Advanced Institute of Technology) Purchases SUSS MA200Compact Mask Aligner for the Manufacture of MEMS and Display Devices

MUNICH, Germany—(BUSINESS WIRE)—June 28, 2006— Samsung Advanced Institute of Technology (SAIT) has recently purchased a SUSS MA200Compact Mask Aligner for its central research facility in Korea. SAIT will use the production aligner from SUSS MicroTec (FWB: SMH) (GER: SMH) for various R&D projects, such as the fabrication of MEMS and Display Devices.

"In recent years SAIT has emerged as the main technology driver behind the global Samsung organization", says Mr. J. S. Kim, Senior Engineer at SAIT, "In order to meet the tough quality demands made on us, SAIT has to rely on equipment that combines superior product performance and an attractive cost of ownership with the flexibility to serve different markets and applications. The MA200Compact from SUSS MicroTec seems to be perfectly suited to our needs. The mask aligner showed excellent process capabilities for a variety of positive and negative resists as well as a stunning alignment accuracy."

"With the MA200Compact SUSS can offer an extremely versatile and cost effective production aligner for a variety of applications, starting from MEMS and Wafer Level Packaging up to optoelectronic and telecommunication devices," comments Rolf Wolf, managing director of SUSS MicroTec's Lithography Division. "The MA200Compact is a very efficient exposure tool for thick resist MEMS applications and offers customized substrate handling for all kinds on non-standard substrates like fragile compound semiconductors, warped, drilled and thin substrates, as well as glass and foils."

With an alignment accuracy less than 0.5(micron) and a throughput better than 100 wafers per hour the MA200Compact represents the next-generation of SUSS full-field production lithography systems. With its high intensity illumination and high intensity optics the MA200Compact features a complete suppression of stray light effects, and a very large depth of focus, which yields excellent results even with high topography wafers.

About Samsung Advanced Institute of Technology (SAIT)

SAIT is the Samsung Group's central R&D organization, established in October 1987 as the incubator for future cutting-edge technologies. As a new business creator, SAIT constantly uncovers and develops disruptive technologies and emerging markets. The Institute pioneers core technologies that will represent the generation that follows the next generation.

As a technology provider, SAIT develops distinctive, next-generation technologies that can strengthen existing business lines. This effort results in core components, materials and solutions. As the Samsung Group's think tank, SAIT devises mid-/long-term technology strategies and develops excellent engineers, leading the ongoing improvement of technology management at Samsung. The Institute also supports a common technology platform group-wide. For more information go to http://www.sait.samsung.co.kr/eng/main.jsp

About SUSS MicroTec

SUSS MicroTec is a leading supplier of production, process and test technology for the semiconductor industry. SUSS maintains its leadership position with over 7,000 systems installed worldwide. SUSS products include coating developing systems, 1X full-field lithography (1XFFL) systems, substrate bonders, flip-chip bonders and probe systems. Headquartered in Munich, Germany, SUSS has 5 international manufacturing sites and provides support from sales and service centers in North America, Europe, Asia and Japan. For more information, please visit http://www.suss.com

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. Words such as "believe", "expect", "intend", "anticipate", "estimate", "should", "may", "will", "plan" and similar words and terms used in relation to the enterprise are meant to indicate forward-looking statements of this kind. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.



Contact:
SUSS MicroTec
Brigitte Wehrmann, +49 (0)89 32007 237

Email Contact

www.suss.com